Deposition Thickness Sensor for Ion Sputtering Apparatus.

• Kumazaki Hironori

  Gifu National College of Technology

• Inaba Seiki

  Gifu National College of Technology

• Hane Kazuhiro

  Tohoku University

書誌事項

タイトル別名

• Deposition Thickness Sensor for Ion Spu

抄録

A quartz core microcantilever fabricated from an optical fiber tip can be utilized for monitoring of deposition thickness. Dynamic monitoring of deposition thickness was performed without influence of electrical noise in an ion sputtering apparatus. Resonance frequencies were measured as a function of deposition time of Au and Ag. Resonance frequency decreased from 11.52kHz to 10.89kHz during a deposition time of 60 minutes which corresponded to a thickness of 360nm in case of Au.

収録刊行物

• 電気学会論文誌Ｅ（センサ・マイクロマシン部門誌）

  電気学会論文誌Ｅ（センサ・マイクロマシン部門誌） 117 (2), 105-108, 1997

  一般社団法人 電気学会

キーワード

• optical sensor
• quartz core microcantilever
• ion sputtering apparatus
• in situ film thickness measurement

詳細情報

• CRID: 1390282679437984768
• NII論文ID: 10004832000
• NII書誌ID: AN1052634X
• DOI: 10.1541/ieejsmas.117.105
• ISSN: 13475525
• ISSN: 13418939
• NDL書誌ID: 4128890
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4128890
• Web Site: http://www.jstage.jst.go.jp/article/ieejsmas1995/117/2/117_2_105/_pdf
• 本文言語コード: en
• データソース種別:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• 抄録ライセンスフラグ: 使用不可