高放射小型赤外線光源用薄膜の開発 Investigation of Thin Film for High emissivity Infrared Micro Emitter

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A platinum infrared emitter by Joule's heat, about 0.5×0.5mm<sup>2</sup> of a pattern size, has been fabricated with micro lithography process of the platinum film on a quartz glass substrate, A hafnium oxide buffer film was used. The heat characteristics of the emitter were examined with thermography and a spectroradiometer. The maximum temperature of the heating emitter is confirmed to be 600°C at least. The platinum film emitter has the emissivity less than 0.1 and is nearly equivalent to gray body in wavelength 4-14μm. The emissivities of ceramics films on the platinum film were investigated to obtain the higher emissivity. The emissivities of oxide ceramics thin films are different from that of bulk targets and less than them. In Corning 7059 thin films, however, the higher emissivity values rather than that of the target is obtained at film thickness 6.7μm in wavelength 7-11μm. The highest value of emissivity of the thick film was 0.96 at wavelength 9.5μm.

収録刊行物

  • 電気学会論文誌. E, センサ・マイクロマシン準部門誌 = The transactions of the Institute of Electrical Engineers of Japan. A publication of Sensors and Micromachines Society  

    電気学会論文誌. E, センサ・マイクロマシン準部門誌 = The transactions of the Institute of Electrical Engineers of Japan. A publication of Sensors and Micromachines Society 117(3), 127-131, 1997-03 

    The Institute of Electrical Engineers of Japan

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各種コード

  • NII論文ID(NAID)
    10004832046
  • NII書誌ID(NCID)
    AN1052634X
  • 本文言語コード
    ENG
  • 資料種別
    ART
  • ISSN
    13418939
  • NDL 記事登録ID
    4150212
  • NDL 雑誌分類
    ZN31(科学技術--電気工学・電気機械工業)
  • NDL 請求記号
    Z16-B380
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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