Computation Program System for Structural Analysis and Quantification of Organic Contaminants on Silicon Wafer Surfaces from Mass Spectra

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抄録

A computer program was developed for the identification and quantification of organic contaminants on silicon wafer surfaces and related materials based on GC/MS spectral data. Information, such as the retention time (RT), mass number and peak intensity, was stored on 359 chemical compounds in the database. Some empirical equations were presented for calculating the existence probabilities of certain organic compounds. This method was confirmed for the identification and quantification of ultratrace organic contaminants on silicon wafer surfaces and related materials.

収録刊行物

  • Analytical sciences : the international journal of the Japan Society for Analytical Chemistry  

    Analytical sciences : the international journal of the Japan Society for Analytical Chemistry 16(6), 593-596, 2000-06-10 

    社団法人 日本分析化学会

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各種コード

  • NII論文ID(NAID)
    10004955042
  • NII書誌ID(NCID)
    AA10500785
  • 本文言語コード
    ENG
  • 資料種別
    ART
  • ISSN
    09106340
  • NDL 記事登録ID
    5380255
  • NDL 雑誌分類
    ZP4(科学技術--化学・化学工業--分析化学)
  • NDL 請求記号
    Z54-F482
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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