Correlation between the Relative Sensitivity Factors and the Sputtering Yields in Glow-Discharge Mass Spectrometry.

• SAKA Takashi

  Department of Applied Electronics, Daido Institute of Technology

• INOUE Mika

  Research and Development Lab., Daido Steel Co. Ltd.

Journal

• Analytical Sciences

  Analytical Sciences 16 (6), 653-655, 2000

  The Japan Society for Analytical Chemistry

Keywords

• Analytical Chemistry

Details

• CRID: 1390001204256979200
• NII Article ID: 10004955316
• NII Book ID: AA10500785
• DOI: 10.2116/analsci.16.653
• COI: 1:CAS:528:DC%2BD3cXksVOitL4%3D
• ISSN: 13482246
• ISSN: 09106340
• NDL BIB ID: 5380300
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I5380300
• Web Site: https://link.springer.com/content/pdf/10.2116/analsci.16.653.pdf
• Web Site: https://link.springer.com/article/10.2116/analsci.16.653/fulltext.html
• Web Site: http://www.jstage.jst.go.jp/article/analsci/16/6/16_6_653/_pdf
• Text Lang: en
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles