チタンターゲットスパッタにおけるチタンイオンの分光測定 Optical Spectroscopy for Titanium Ions in Titanium Magnetron Sputtering
Plasma diagnostics in titanium (Ti) rf (13.56 MHz) magnetron sputtering were carried out using optical emission spectroscopy and atomic absorption spectrometry. Ti ions (Ti II) optical emission intensity in pure argon (Ar) discharge was compared with calculated optical emission intensity. Ti II absorption signal was obtained using absorption line of 336.1 nm, 337.3 nm, 338.4 nm (α<SUP>4</SUP><I>F</I>-<I>z</I><SUP>4</SUP><I>G</I>°). The dependence of Ti II optical emission intensity on rf power and Ar pressure was also investigated.
真空 45(3), 169-172, 2002-03-20
The Vacuum Society of Japan