Electrical Conductivity of Co Thin Films at Low Temperature.

• YAKABE Taro

  National Institute for Materials Science

• TERAI Yoshikazu

  National Institute for Materials Science

• YASUZUKA Syuma

  National Institute for Materials Science Hokkaido University

• TERAKURA Chieko

  National Institute for Materials Science

• TERASHIMA Taichi

  National Institute for Materials Science

• UJI Shinya

  National Institute for Materials Science

• FUJITA Daisuke

  National Institute for Materials Science

• KIDO Giyuu

  National Institute for Materials Science

Bibliographic Information

Other Title

• Ｃｏ薄膜の低温における電気伝導特性
• Co ハクマク ノ テイオン ニ オケル デンキ デンドウ トクセイ

Abstract

The electrical conductivities of Co thin films with the thickness in the range 2.530 nm have been studied. In the low temperature region, the sheet conductivities for the films of 3.05.0 nm show logarithmic temperature dependence. The dependence is interpreted by the electron-electron interaction effect rather than the weak localization effect. The coefficient of the logarithmic behavior is found to be suppressed as the thickness decreases, which may be interpreted in terms of the percolation effect.

Journal

• Shinku

  Shinku 45 (3), 235-238, 2002

  The Vacuum Society of Japan

Keywords

• Electrical and Electronic Engineering
• Surfaces, Coatings and Films
• Condensed Matter Physics

Details

• CRID: 1390282679041531008
• NII Article ID: 10008203040
• NII Book ID: AN00119871
• DOI: 10.3131/jvsj.45.235
• ISSN: 18809413
• ISSN: 05598516
• NDL BIB ID: 6144548
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I6144548
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed