高出力エキシマレーザーを用いたパルスレーザー堆積法で作製した酸化インジウムスズ透明導電膜 Transparent Conducting Indium Tin Oxide Films Prepared by Pulsed Laser Deposition Using High Power ArF Excimer Laser

この論文にアクセスする

この論文をさがす

著者

    • 鈴木 晶雄 SUZUKI Akio
    • 大阪産業大学工学部電気電子工学科 Department of Electrical Engineering and Electronics, College of Engineering, Osaka Sangyo University
    • 守 昭人 MORI Akihito
    • 大阪産業大学工学部電気電子工学科 Department of Electrical Engineering and Electronics, College of Engineering, Osaka Sangyo University
    • 坂本 淳 [他] SAKAMOTO Jun
    • 大阪産業大学工学部電気電子工学科 Department of Electrical Engineering and Electronics, College of Engineering, Osaka Sangyo University
    • 谷 善之 TANI Yoshiyuki
    • 大阪産業大学工学部電気電子工学科 Department of Electrical Engineering and Electronics, College of Engineering, Osaka Sangyo University
    • 青木 孝憲 AOKI Takanori
    • 大阪産業大学工学部電気電子工学科 Department of Electrical Engineering and Electronics, College of Engineering, Osaka Sangyo University
    • 松下 辰彦 MATSUSHITA Tatsuhiko
    • 大阪産業大学工学部電気電子工学科 Department of Electrical Engineering and Electronics, College of Engineering, Osaka Sangyo University
    • 奥田 昌宏 OKUDA Masahiro
    • 大阪府立大学工学部電子物理工学科 Department of Physics and Electronics, College of Engineering, Osaka Prefecture University

抄録

In<SUB>2</SUB>O<SUB>3</SUB> doped with 5 wt% SnO<SUB>2</SUB> (indium-tin oxide (ITO) (5 wt%)) films were deposited on glass substrates by pulsed laser deposition using an ArF excimer laser (λ= 193 nm). In all experiments, repetition rates of 150 Hz, the energy density of 6 J/cm<SUP>2</SUP>, and an ablation time of 30-900 sec were used. A lowest resistivity of 8.45 × 10<SUP>-5</SUP> Ω ·cm and an optical transmittance of more than 80% in the visible range of the spectrum were obtained for ITO (5 wt%) films of approximately 300-nm thickness fabricated at a substrate temperature of 400°C and oxygen pressure of 10 Pa. Smooth surfaces with an average surface roughness of 1.26 nm were observed by field-emission scanning electron microscopy (FESEM) and atomic force microscopy (AFM).

収録刊行物

  • 真空

    真空 45(3), 243-246, 2002-03-20

    The Vacuum Society of Japan

参考文献:  14件中 1-14件 を表示

各種コード

  • NII論文ID(NAID)
    10008203066
  • NII書誌ID(NCID)
    AN00119871
  • 本文言語コード
    JPN
  • 資料種別
    SHO
  • ISSN
    05598516
  • NDL 記事登録ID
    6144573
  • NDL 雑誌分類
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL 請求記号
    Z16-474
  • データ提供元
    CJP書誌  NDL  J-STAGE 
ページトップへ