Transparent Conducting Indium Tin Oxide Films Prepared by Pulsed Laser Deposition Using High Power ArF Excimer Laser.
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- SUZUKI Akio
- Department of Electrical Engineering and Electronics, College of Engineering, Osaka Sangyo University
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- MORI Akihito
- Department of Electrical Engineering and Electronics, College of Engineering, Osaka Sangyo University
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- SAKAMOTO Jun
- Department of Electrical Engineering and Electronics, College of Engineering, Osaka Sangyo University
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- TANI Yoshiyuki
- Department of Electrical Engineering and Electronics, College of Engineering, Osaka Sangyo University
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- AOKI Takanori
- Department of Electrical Engineering and Electronics, College of Engineering, Osaka Sangyo University
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- MATSUSHITA Tatsuhiko
- Department of Electrical Engineering and Electronics, College of Engineering, Osaka Sangyo University
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- OKUDA Masahiro
- Department of Physics and Electronics, College of Engineering, Osaka Prefecture University
Bibliographic Information
- Other Title
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- 高出力エキシマレーザーを用いたパルスレーザー堆積法で作製した酸化インジウムスズ透明導電膜
- コウシュツリョク エキシマレーザー オ モチイタ パルスレーザー タイセキホウ デ サクセイ シタ サンカ インジウムスズ トウメイ ドウデン マク
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Abstract
In2O3 doped with 5 wt% SnO2 (indium-tin oxide (ITO) (5 wt%)) films were deposited on glass substrates by pulsed laser deposition using an ArF excimer laser (λ= 193 nm). In all experiments, repetition rates of 150 Hz, the energy density of 6 J/cm2, and an ablation time of 30-900 sec were used. A lowest resistivity of 8.45 × 10-5 Ω ·cm and an optical transmittance of more than 80% in the visible range of the spectrum were obtained for ITO (5 wt%) films of approximately 300-nm thickness fabricated at a substrate temperature of 400°C and oxygen pressure of 10 Pa. Smooth surfaces with an average surface roughness of 1.26 nm were observed by field-emission scanning electron microscopy (FESEM) and atomic force microscopy (AFM).
Journal
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- Shinku
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Shinku 45 (3), 243-246, 2002
The Vacuum Society of Japan
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Details 詳細情報について
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- CRID
- 1390282679041500032
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- NII Article ID
- 10008203066
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- NII Book ID
- AN00119871
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- ISSN
- 18809413
- 05598516
- http://id.crossref.org/issn/05598516
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- NDL BIB ID
- 6144573
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed