Chemical shift mapping of Si L and K edges using spatially resolved EELS and energy-filtering TEM

• Koji Kimoto

• Tomoko Sekiguchi

• Takashi Aoyama

Bibliographic Information

Other Title

• Chemical shift mapping of Si L and K ed

Journal

• Journal of electron microscopy

  Journal of electron microscopy 46 (5), 369-374, 1997-10

  Oxford : Published for the Japanese Society of Electron Microscopy by Oxford University Press

Details

• CRID: 1520854805097863552
• NII Article ID: 10008812157
• NII Book ID: AA00697060
• ISSN: 00220744
• NDL BIB ID: 4346281
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4346281
• Text Lang: en
• NDL Source Classification:
  • ZN33(科学技術--電気工学・電気機械工業--電子工学・電気通信)
• Data Source:
  • NDL
  • CiNii Articles