Static capacitance contrast of LSI covered with an insulator film in low accelerating voltage scanning electron microscope

• Katsumi Ura

• Sadao Aoyagi

収録刊行物

• Journal of electron microscopy

  Journal of electron microscopy 49 (1), 157-162, 2000

  Oxford : Published for the Japanese Society of Electron Microscopy by Oxford University Press

キーワード

• re-distribution of secondary electrons
• passivated LSI

詳細情報

• CRID: 1521417755468908800
• NII論文ID: 10008817275
• NII書誌ID: AA00697060
• ISSN: 00220744
• NDL書誌ID: 5315963
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I5315963
• 本文言語コード: en
• NDL 雑誌分類:
  • ZN33(科学技術--電気工学・電気機械工業--電子工学・電気通信)
• データソース種別:
  • NDL
  • CiNii Articles