容量結合型大気圧マイクロプラズマ源 Capacitively Coupled Atmospheric Microplasma Source

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Capacitively coupled micro-plasma (CCMP) was generated in a capillary on a quartz and a poly (ethyleneterephthalate) (PET) chip of 20 × 20 mm<SUP>2</SUP> by excitation frequency of 13.5660 MHz at atmospheric pressure. The π-type matching circuit was miniaturized (150 × 100 × 40 mm<SUP>3</SUP>) and an inductance <I>L</I> was optimized to satisfy the resonance condition with excitation frequency, so that an atmospheric He discharge was attained at an incident power less than 5 W. He atomic excitation temperature <I>T</I><SUB>exc</SUB> was estimated by the Boltzmann plot. It was found that Texc increases with increasing excitation frequency. The Si oxide thin films were prepared on inner wall of a poly (ethylene terephthalate) (PET) capillary with a cross section of φ500 μm and a length of 6 mm using the CCMP with gas flow rates of O<SUB>2</SUB>+ TEOS/He = 3.5/350 sccm under the condition of atmospheric pressure and room temperature. The X-ray photoelectron spectroscopy (XPS) mapping confirmed that Si oxide films were deposited on inner wall of a PET capillary.

収録刊行物

  • 真空

    真空 45(5), 428-432, 2002-05-20

    The Vacuum Society of Japan

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各種コード

  • NII論文ID(NAID)
    10008831041
  • NII書誌ID(NCID)
    AN00119871
  • 本文言語コード
    JPN
  • 資料種別
    SHO
  • ISSN
    05598516
  • NDL 記事登録ID
    6193420
  • NDL 雑誌分類
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL 請求記号
    Z16-474
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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