アルミニウム表面の窒化反応 Nitridation of Aluminum Surface

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著者

    • 阿部 積 ABE Izumo
    • 東北大学多元物質科学研究所 Institute of Multidisciplinary Research for Advanced Materials, Tohoku University
    • 楠 勲 KUSUNOKI Isao
    • 東北大学多元物質科学研究所 Institute of Multidisciplinary Research for Advanced Materials, Tohoku University

抄録

Aluminum surfaces were nitrided with a 500 eV nitrogen ion beam at 25°C or with an ammonia molecular beam at 400°C. The nitrided surfaces were studied in situ under ultrahigh vacuum by X-ray photoelectron spectroscopy (XPS), <I>ex situ</I> by scanning electron microscopy (SEM), atomic force microscopy (AFM) and cathode luminescence (CL). The evolutions of the Al 2p and N 1s XP spectra during the nitridation show the difference of the reaction mechanism, though the XP spectra obtained at the saturation in the up-take curve of nitrogen were alike. The nitrogen atoms of the N<SUP>+</SUP><SUB>2</SUB> ion beam can penetrate into the bulk of aluminum and form the nitride even at room temperature, while the ammonia molecules are adsorbed on the surface and react with aluminum atoms supplied from the surface and the bulk. In the SEM and AFM images, an island-like structure was observed on the surface nitrided with the NH<SUB>3</SUB> molecular beam. Moreover, a characteristic luminescence was observed from the sample nitrided with the molecular beam.

収録刊行物

  • 真空

    真空 45(5), 463-467, 2002-05-20

    The Vacuum Society of Japan

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各種コード

  • NII論文ID(NAID)
    10008831119
  • NII書誌ID(NCID)
    AN00119871
  • 本文言語コード
    JPN
  • 資料種別
    SHO
  • ISSN
    05598516
  • NDL 記事登録ID
    6193475
  • NDL 雑誌分類
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL 請求記号
    Z16-474
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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