Measurement of mean free paths for inelastic electron scattering of Si and SiO2

• Lee Chang-Woo

• Ikematsu Yoichi

• Shindo Daisuke

収録刊行物

• Journal of electron microscopy

  Journal of electron microscopy 51 (3), 143-148, 2002

  Oxford : Published for the Japanese Society of Electron Microscopy by Oxford University Press

キーワード

• mean free path for inelastic scattering
• electron energy-loss spectroscopy
• accelerating voltage
• collection angle
• silicon
• silicon dioxide

詳細情報

• CRID: 1523669554663799040
• NII論文ID: 10011532259
• NII書誌ID: AA00697060
• ISSN: 00220744
• NDL書誌ID: 6189554
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I6189554
• 本文言語コード: en
• NDL 雑誌分類:
  • ZN33(科学技術--電気工学・電気機械工業--電子工学・電気通信)
• データソース種別:
  • NDL
  • CiNii Articles