The Effect of Partial Pressure of Oxygen on Self-Diffusion of Si in SiO₂

• Fukatsu Shigeto

  Department of Applied Physics and Physico-Informatics and CREST-JST, Keio University

• Takahashi Tomonori

  Department of Applied Physics and Physico-Informatics and CREST-JST, Keio University

• Itoh Kohei M.

  Department of Applied Physics and Physico-Informatics and CREST-JST, Keio University

• Uematsu Masashi

  NTT Basic Research Laboratories, NTT Corporation

• Fujiwara Akira

  NTT Basic Research Laboratories, NTT Corporation

• Kageshima Hiroyuki

  NTT Basic Research Laboratories, NTT Corporation

• Takahashi Yasuo

  NTT Basic Research Laboratories, NTT Corporation

• Shiraishi Kenji

  Institute of Physics, University of Tsukuba

書誌事項

タイトル別名

• The Effect of Partial Pressure of Oxygen on Self-Diffusion of Si in SiO2
• Effect of Partial Pressure of Oxygen on Self Diffusion of Si in SiO2

抄録

The self-diffusion coefficient of Si in thermal oxides (SiO₂) formed on semiconductor silicon wafers has been determined with isotope heterostructures, ^natSiO₂/²⁸SiO₂, as a function of the partial pressure of oxygen mixed into argon annealing ambient. The ^natSiO₂ layers contain 3.1% of ³⁰Si stable isotopes while the ²⁸SiO₂ layers are depleted of ³⁰Si stable isotopes down to 0.003%, and the diffusion depth profiles of ³⁰Si isotopes from the ^natSiO₂ to ²⁸SiO₂ layers after thermal annealing have been determined by secondary ion mass spectrometry (SIMS). The Si self-diffusivity is found not to depend on the partial pressure of oxygen within our experimental error of about ±33%.

収録刊行物

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 42 (12B), L1492-L1494, 2003

  The Japan Society of Applied Physics

キーワード

• silicon electronics
• silicon dioxide
• self-diffusion
• gate insulator

詳細情報

• CRID: 1390282681240345216
• NII論文ID: 210000054796
• NII論文ID: 10011841401
• NII書誌ID: AA11906093
• DOI: 10.1143/jjap.42.l1492
• ISSN: 13474065
• ISSN: 00214922
• ISSN: http://id.crossref.org/issn/13474065
• NDL書誌ID: 6785424
• Web Site: http://id.ndl.go.jp/bib/6785424
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I6785424
• Web Site: http://stacks.iop.org/1347-4065/42/i=12B/a=L1492/pdf
• 本文言語コード: en
• データソース種別:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• 抄録ライセンスフラグ: 使用不可