Residual Stress of TiNi Shape Memory Alloy Thin Films with(111) Single-crystal Silicon Wafer

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著者

    • Wu Tingbin WU Tingbin
    • Open Lab of Education Ministry for High-Temperature Materials and Testing, Shanghai Jiao Tong University
    • Qi Xuan [他] QI Xuan
    • Open Lab of Education Ministry for High-Temperature Materials and Testing, Shanghai Jiao Tong University
    • LIU Yushu
    • Open Lab of Education Ministry for High-Temperature Materials and Testing, Shanghai Jiao Tong University
    • XU Dong
    • Key Lab of Education Ministry for Micro-Processing and Technique, Shanghai Jiao Tong University
    • WANG Li
    • Key Lab of Education Ministry for Micro-Processing and Technique, Shanghai Jiao Tong University

収録刊行物

  • Materials transactions

    Materials transactions 43(3), 566-570, 2002-03-01

    Japan Institute of Metals

参考文献:  16件中 1-16件 を表示

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各種コード

  • NII論文ID(NAID)
    10012322005
  • NII書誌ID(NCID)
    AA1151294X
  • 本文言語コード
    ENG
  • 資料種別
    ART
  • ISSN
    13459678
  • NDL 記事登録ID
    6111258
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z53-J286
  • データ提供元
    CJP書誌  NDL 
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