Composition Control of R. F. -Sputtered Ni_2MnGa Thin Films Using Optical Emission Spectroscopy

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Optical emission spectroscopy can be used to monitor the composition of Ni<SUB>2</SUB>MnGa thin films during sputtering. By choosing peaks of Ni:341.5 nm, Mn:403.1 nm and Ga:417.2 nm, the Ar pressure is found to affect the spectrum intensities of Ni, Mn and Ga atoms, as well as the intensity ratios of <I>I</I><SUB>Mn</SUB>⁄<I>I</I><SUB>Ni</SUB> and <I>I</I><SUB>Ga</SUB>⁄<I>I</I><SUB>Ni</SUB>. However, the r.f. power has no obvious effect on them. This may be due to the ferromagnetic characteristic of Ni, or that different metals have different energy distributions of sputtered atoms, or that they need various <I>p</I>·<I>d</I> values to be thermalized. Here, <I>p</I> is the Ar pressure and <I>d</I> is the target and substrate distance. The intensity ratios of these peaks are found to be proportional to the composition ratios (mol ratio) of thin films with the relations: <I>C</I><SUB>Mn</SUB>⁄<I>C</I><SUB>Ni</SUB>=0.0151(<I>I</I><SUB>Mn</SUB>⁄<I>I</I><SUB>Ni</SUB>)+0.392 and <I>C</I><SUB>Ga</SUB>⁄<I>C</I><SUB>Ni</SUB>=0.0720(<I>I</I><SUB>Ga</SUB>⁄<I>I</I><SUB>Ni</SUB>)+0.273. Hence, the composition of sputtered thin films can be predicted by monitoring the intensity of light emission from the sputtering plasma.

収録刊行物

  • Materials transactions

    Materials transactions 43(5), 871-875, 2002-05-01

    公益社団法人 日本金属学会

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各種コード

  • NII論文ID(NAID)
    10012322878
  • NII書誌ID(NCID)
    AA1151294X
  • 本文言語コード
    ENG
  • 資料種別
    ART
  • ISSN
    13459678
  • NDL 記事登録ID
    6179531
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z53-J286
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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