Effects of Protium Introduction on Electrical and Optical Properties of Tin-Germanium Oxide Thin Films
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- Arita Makoto
- Department of Materials Science and Engineering, Faculty of Engineering, Kyushu University
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- Konishi Hirofumi
- Department of Materials Science and Engineering, Faculty of Engineering, Kyushu University
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- Masuda Masataka
- Department of Materials Science and Engineering, Faculty of Engineering, Kyushu University
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- Hayashi Yasunori
- Department of Materials Science and Engineering, Faculty of Engineering, Kyushu University
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Abstract
Tin-germanium oxide thin films with various Ge/Sn ratios were deposited by RF magnetron sputtering. The electrical and optical properties of these films were investigated. All the as-deposited films were transparent to visible light. No effect was observed by hydrogen ion implantation on the electrical resistivity of the Ge rich (Sn/Ge≤1) films. On the other hand, hydrogen ion implantation improved the conductivity of the Sn rich (Sn/Ge≥4) films. The enhancement of the conductivity would be attributed to the increase in carrier density by protium introduction.
Journal
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- MATERIALS TRANSACTIONS
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MATERIALS TRANSACTIONS 43 (11), 2670-2672, 2002
The Japan Institute of Metals and Materials
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Details 詳細情報について
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- CRID
- 1390282679224909184
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- NII Article ID
- 130004451705
- 10012327706
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- NII Book ID
- AA1151294X
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- COI
- 1:CAS:528:DC%2BD3sXjtFam
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- ISSN
- 13475320
- 13459678
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- NDL BIB ID
- 6366916
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- Text Lang
- en
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed