Photocatalytic Preparation of Cuprous Oxide Crystals Using a TiO2 Catalyst
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- Sanuki Sumiko
- Department of Material Systems Engineering and Life Science, Faculty of Engineering, Toyama University
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- Nakagawa Kazuyuki
- Department of Material Systems Engineering and Life Science, Faculty of Engineering, Toyama University
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- Kato Tomoko
- Department of Material Systems Engineering and Life Science, Faculty of Engineering, Toyama University
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- Nagaoka Shigeru
- Research and Development Department, Titan Kogyo K.K.
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- Majima Hiroshi
- Professor Emeritus, Kyoto University, and Special Advisor, Titan Kogyo K.K.
書誌事項
- タイトル別名
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- Photocatalytic Preparation of Cuprous Oxide Crystals Using a TiO<SUB>2</SUB> Catalyst
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抄録
Reddish cuprous oxide crystals can be readily formed by irradiating an aqueous alkaline Cu(II) solution containing suitable complexing agents with UV or sunlight in the presence of a photocatalyst such as TiO2 or ZnO . Various factors, including the Cu(II) concentration, pH of the Cu(II) solution, amount of TiO2 catalyst, method used to agitate the test suspension, concentration of potassium sodium tartarate, and intensity of UV radiation, affecting cuprous oxide preparations were investigated. Concentrations of Cu(II) and potassium sodium tartarate have no significant effect on reaction rates, while pH, and amount of TiO2, play important roles in the reaction. The dispersion of TiO2 in Cu(II) solution is another important factor. Cu(II) reduction rate is not affected as far as the amount of reduced Cu(II) plotted against the cumulative intensity of UV radiation is concerned. It is necessary to stop the cuprous oxide formation before the complete reduction of Cu(II), since metallic copper is formed on cuprous oxide.
収録刊行物
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- MATERIALS TRANSACTIONS
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MATERIALS TRANSACTIONS 43 (12), 3247-3253, 2002
公益社団法人 日本金属学会
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詳細情報 詳細情報について
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- CRID
- 1390001204251629184
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- NII論文ID
- 10012329689
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- NII書誌ID
- AA1151294X
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- COI
- 1:CAS:528:DC%2BD3sXhtF2msbc%3D
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- ISSN
- 13475320
- 13459678
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- NDL書誌ID
- 6395745
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
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- 抄録ライセンスフラグ
- 使用不可