Thermal Stability of W_2N Compound Barrier in W/W_2N/poly-Si Gate Electrode Configuration

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著者

    • NOYA Atsushi
    • Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Technology
    • TAKEYAMA Mayumi B.
    • Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Technology

収録刊行物

  • IEICE transactions on electronics

    IEICE transactions on electronics 86(11), 2332-2335, 2003-11-01

参考文献:  10件中 1-10件 を表示

各種コード

  • NII論文ID(NAID)
    10012451942
  • NII書誌ID(NCID)
    AA10826283
  • 本文言語コード
    ENG
  • 資料種別
    SHO
  • ISSN
    09168524
  • データ提供元
    CJP書誌 
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