Characteristics of Induced Current Due to Laser Plasma and Its Application to Laser Processing Monitoring

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  • Madjid Syahrun Nur
    Department of Electrical and Electronic Engineering, Faculty of Engineering, Fukui University
  • Kitazima Iwao
    Department of Electrical and Electronic Engineering, Faculty of Engineering, Fukui University
  • Kobayashi Takao
    Department of Electrical and Electronic Engineering, Faculty of Engineering, Fukui University
  • Lee Yong Inn
    Physics Department, Chonbuk National University
  • Kagawa Kiichiro
    Department of Physics, Faculty of Education and Regional Studies, Fukui University

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A third harmonic of a Nd-Yttrium Aluminum Garnet laser (355 nm, 10–50 mJ, 7 ns, 10 Hz) was focused in air or He gas at atmospheric pressure to produce microgas plasma. Two flat electrodes (25mm×25mm) were arranged in parallel with a 1.5 cm separation to allow the microgas plasma to be sandwiched by the electrodes. A DC voltage was supplied to the electrodes and the induced current due to the generated laser plasma was detected using an oscilloscope. The characteristics of the induced current were studied by changing parameters such as supplied voltage (50–700 V), laser pulse energy (2–50 mJ) and the type of gas, and compared with the optical emission characteristics. A similar experiment was carried out on the target plasma by placing a small rod sample (diameter of 2 mm) of various materials such as brass, iron, aluminum, plastic and wood, near the focusing point between the electrodes. It is stressed that the induced current signal is very useful for monitoring of the laser processing, that is, to determine the precise focusing condition and to identify the moment when the laser beam begins to penetrate the sample.

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