Photocleavage Processes in an Iminosulfonate Derivative Usable as Photoacid in Resist Technology

• LALEVEE Jacques

  Department de Photochimie Generale, UMR n°7525, Ecole Nationale Superieure de Chimie

• ALLONAS Xavier

  Department de Photochimie Generale, UMR n°7525, Ecole Nationale Superieure de Chimie

• FOUASSIER Jean-Pierre

  Department de Photochimie Generale, UMR n°7525, Ecole Nationale Superieure de Chimie

• SHIRAI Masamitsu

  Department of Applied Chemistry, Osaka Prefecture University

• TSUNOOKA Masahiro

  Department of Applied Chemistry, Osaka Prefecture University

収録刊行物

• Chemistry letters

  Chemistry letters 32 (2), 178-179, 2003-02-05

詳細情報

• CRID: 1573105974948641408
• NII論文ID: 10012814101
• NII書誌ID: AA00603318
• ISSN: 03667022
• 本文言語コード: en
• データソース種別:
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