Nd:YAGレーザーを用いたパルスレーザー堆積法によるβ-FeSi_2薄膜の作製と特性改善 Fabrication of β-FeSi_2 Thin Films by PLD Method and Improvement of Film-quality by Laser Annealing Process Using a Nd:YAG Laser

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著者

    • 鈴木 晶雄 SUZUKI Akio
    • 大阪産業大学工学部電気電子工学科 Department of Electrical Engineering and Electronics, College of Engineering, Osaka Sangyo University
    • 安井 光弘 YASUI Mitsuhiro
    • 大阪産業大学工学部電気電子工学科 Department of Electrical Engineering and Electronics, College of Engineering, Osaka Sangyo University
    • 青木 孝憲 [他] AOKI Takanori
    • 大阪産業大学工学部電気電子工学科 Department of Electrical Engineering and Electronics, College of Engineering, Osaka Sangyo University
    • 松下 辰彦 MATSUSHITA Tatsuhiko
    • 大阪産業大学工学部電気電子工学科 Department of Electrical Engineering and Electronics, College of Engineering, Osaka Sangyo University
    • 奥田 昌宏 OKUDA Masahiro
    • 大阪府立大学工学部電子物理工学科 Department of Physics and Electronics, College of Engineering, Osaka Prefecture University

抄録

β-FeSi<SUB>2</SUB> thin films were deposited on Si (111) by a pulsed laser deposition using a Nd : YAG laser. It was identified from XRD spectra of the as-deposited films that β-FeSi<SUB>2</SUB> (220) and β-FeSi<SUB>2</SUB> (202) were grown epitaxially on the Si (111) substrate. It was found that the crystallinity of the films improved through a laser annealing process making use of the Nd : YAG laser with the low power density.

収録刊行物

  • 真空 = JOURNAL OF THE VACUUM SOCIETY OF JAPAN

    真空 = JOURNAL OF THE VACUUM SOCIETY OF JAPAN 47(3), 224-227, 2004-03-20

    The Vacuum Society of Japan

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各種コード

  • NII論文ID(NAID)
    10012867191
  • NII書誌ID(NCID)
    AN00119871
  • 本文言語コード
    JPN
  • 資料種別
    SHO
  • ISSN
    05598516
  • NDL 記事登録ID
    6930097
  • NDL 雑誌分類
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL 請求記号
    Z16-474
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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