Crystallinity and Photocatalytic Activity of TiO2 Films Deposited by Reactive Sputtering Using Various Magnetic Field Strengths

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著者

    • Irie Yukiko Irie Yukiko
    • School of Science and Engineering, Aoyama Gakuin University, 5-10-1 Fuchinobe, Sagamihara, Kanagawa 229-8558, Japan
    • Sato Yasushi
    • School of Science and Engineering, Aoyama Gakuin University, 5-10-1 Fuchinobe, Sagamihara, Kanagawa 229-8558, Japan
    • Shigesato Yuzo
    • School of Science and Engineering, Aoyama Gakuin University, 5-10-1 Fuchinobe, Sagamihara, Kanagawa 229-8558, Japan

抄録

TiO2 films were deposited by r.f. reactive magnetron sputtering on nonalkali glass without substrate heating using a 3-inch-$\phi$ magnetron cathode with various magnetic field strengths (MFS, 150–1000 G) and shapes (balanced or unbalanced) at a total gas pressure of 1.0 or 3.0 Pa. The crystallinity and photocatalytic activity of TiO2 films showed a clear tendency to decrease with the decrease in MFS during the deposition. Decrease in plasma impedance by increasing the MFS was confirmed to be effective in the deposition of high-performance photocatalytic TiO2 films by magnetron sputtering.

収録刊行物

  • Japanese journal of applied physics. Pt. 2, Letters

    Japanese journal of applied physics. Pt. 2, Letters 43(4A), L442-L445, 2004-04-01

    Japan Society of Applied Physics

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各種コード

  • NII論文ID(NAID)
    10012930363
  • NII書誌ID(NCID)
    AA10650595
  • 本文言語コード
    EN
  • 資料種別
    SHO
  • ISSN
    0021-4922
  • NDL 記事登録ID
    6904064
  • NDL 雑誌分類
    ZM35(科学技術--物理学)
  • NDL 請求記号
    Z54-J337
  • データ提供元
    CJP書誌  NDL  JSAP 
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