Improvement in Oxidation Resistance of Cu-Al Dilute Alloys by Pre-annealing in H2 and Ar Atmospheres

• Hong Sang-Hwui

  Institute of Multidisciplinary Research for Advanced Materials, Tohoku University

• Mimura Kouji

  Institute of Multidisciplinary Research for Advanced Materials, Tohoku University

• Zhu Yongfu

  Institute of Multidisciplinary Research for Advanced Materials, Tohoku University

• Isshiki Minoru

  Institute of Multidisciplinary Research for Advanced Materials, Tohoku University

書誌事項

タイトル別名

• Improvement in Oxidation Resistance of Cu-Al Dilute Alloys by Pre-annealing in H<SUB>2</SUB> and Ar Atmospheres

抄録

The formation of protective Al₂O₃ thin layers on Cu-Al dilute alloys and their effect on the oxidation resistance has been investigated at high temperatures. Since selective and preferential oxidation of Al in Cu-Al alloys would take place under the very low oxygen pressures, Cu-Al (Al: 0.2∼2 mass%) alloys were annealed at various temperatures in H₂ and/or Ar atmosphere. Continuous stable Al₂O₃ thin layers were formed on the specimens annealed in Ar after H₂ annealing. Owing to the protective thin Al₂O₃ layers, the high temperature oxidation rates decreased to about 1/20 to 1/40 times lower than that of pure Cu.

収録刊行物

• MATERIALS TRANSACTIONS

  MATERIALS TRANSACTIONS 46 (2), 167-170, 2005

  公益社団法人 日本金属学会

キーワード

• copper-aluminum alloy
• oxidation resistance
• protective oxide layer
• surface Al<SUB>2</SUB>O<SUB>3</SUB> layer
• preferential oxidation

詳細情報

• CRID: 1390282679225686528
• NII論文ID: 10014416999
• NII書誌ID: AA1151294X
• DOI: 10.2320/matertrans.46.167
• COI: 1:CAS:528:DC%2BD2MXjtFWltL4%3D
• ISSN: 13475320
• ISSN: 13459678
• NDL書誌ID: 7256673
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I7256673
• Web Site: https://www.jstage.jst.go.jp/article/matertrans/46/2/46_2_167/_pdf
• 本文言語コード: en
• データソース種別:
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  • NDL
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  • CiNii Articles
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