Examining Poly(Phenylene Sulfide) Adhesion using Cluster Models

• ROMAN Tanglaw

  Department of Applied Physics, Osaka University

• DAVID Melanie

  Department of Applied Physics, Osaka University

• DIÑO Wilson Agerico

  Department of Physics, Osaka University Center for the Promotion of Research on Nanoscience and Nanotechnology, Osaka University Physics Department, De La Salle University

• NAKANISHI Hiroshi

  Department of Applied Physics, Osaka University

• KASAI Hideaki

  Department of Applied Physics, Osaka University

• MIYAKO Yoshihito

  Department of Applied Physics, Osaka University

• ANDO Naoki

  Taiseiplas Corporation

• NARITOMI Masanori

  Taiseiplas Corporation

抄録

Density functional theory-based calculations on representative cluster models have been performed to investigate the adhesion strength of poly(phenylene sulfide) (PPS) onto magnesium, silicon and titanium, in addition to previously studied aluminum, copper, silver, and gold. Energy relations of substrate atom interactions with the sulfur end of a PPS monomer showed strongest binding with titanium and aluminum, while the larger transition metals showed the weakest results. A further investigation on the interaction of aluminum with the sulfur atom of a diphenyl sulfide model suggests a strong orientation dependence of the adhesion process, as shown in the greater preference for the in-plane case.

収録刊行物

• 真空

  真空 48 (3), 235-237, 2005

  一般社団法人 日本真空学会

キーワード

• Electrical and Electronic Engineering
• Surfaces, Coatings and Films
• Condensed Matter Physics

詳細情報

• CRID: 1390001204063353472
• NII論文ID: 10015476816
• NII書誌ID: AN00119871
• DOI: 10.3131/jvsj.48.235
• ISSN: 18809413
• ISSN: 05598516
• NDL書誌ID: 7322410
• Web Site: http://id.ndl.go.jp/bib/7322410
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I7322410
• 本文言語コード: en
• データソース種別:
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  • NDL
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• 抄録ライセンスフラグ: 使用不可