Characterization of Ion Beam Deposited 107Ag Thin Films on Si(111) Surface by means of Rutherford Backscattering Spectroscopy and Reflection High Energy Electron Diffraction

• Takahiro Asai

• Masanori Takeuchi

• Akihiro Urano

書誌事項

タイトル別名

• Characterization of Ion Beam Deposited 107Ag Thin Films on Si 111 Surface by means of Rutherford Backscattering Spectroscopy and Reflection High Energy Electron Diffraction
• Special Issue Isotope Science and Engineering from Basics to Applications ; Isotope and Materials
• Special Issue Isotope Science and Engineering from Basics to Applications ; Isotope and Materials

収録刊行物

• Journal of nuclear science and technology = 日本原子力学会英文論文誌

  Journal of nuclear science and technology = 日本原子力学会英文論文誌 43 (4), 386-390, 2006-04

  Tokyo : Atomic Energy Society of Japan

キーワード

• ion beam deposition
• isotope
• silver
• silicon
• growth
• morphology
• channeling
• Auger electron spectroscopy

詳細情報

• CRID: 1520009407466081024
• NII論文ID: 10016800934
• NII書誌ID: AA00703720
• ISSN: 00223131
• NDL書誌ID: 7893804
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I7893804
• 本文言語コード: en
• NDL 雑誌分類:
  • ZM35(科学技術--物理学)
• データソース種別:
  • NDL
  • CiNii Articles