Metal CVD Technology for ULSI Applications : The Aluminum Route
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- KNORR Andreas
- New York State Center for Advanced Thin Film Technology and Department of Physics, University at Albany-SUNY
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- FALTERMEIER Jonathan
- New York State Center for Advanced Thin Film Technology and Department of Physics, University at Albany-SUNY
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- TALEVI Robert
- New York State Center for Advanced Thin Film Technology and Department of Physics, University at Albany-SUNY
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- GUNDLACH Heidi
- New York State Center for Advanced Thin Film Technology and Department of Physics, University at Albany-SUNY
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- KUMAR Kaushik Arun
- New York State Center for Advanced Thin Film Technology and Department of Physics, University at Albany-SUNY
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- PETERSON Gregory G.
- New York State Center for Advanced Thin Film Technology and Department of Physics, University at Albany-SUNY
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- KALOYEROS Alain E.
- New York State Center for Advanced Thin Film Technology and Department of Physics, University at Albany-SUNY
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Journal
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- Extended abstracts of the ... Conference on Solid State Devices and Materials
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Extended abstracts of the ... Conference on Solid State Devices and Materials 1996 109-111, 1996-08-26
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Details 詳細情報について
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- CRID
- 1573387450027006208
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- NII Article ID
- 10017199067
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- NII Book ID
- AA10777858
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- Text Lang
- en
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- Data Source
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- CiNii Articles