The Cleaning of Particle and Metallic Impurity on Si Wafer Surface by Fluorine Etchant

• IZUMI H.

  Department of Electronics, Faculty of Engineering, Tohoku University

• NOSE M.

  Department of Electronics, Faculty of Engineering, Tohoku University

• OJIMA S.

  Department of Electronics, Faculty of Engineering, Tohoku University

• KUBO K.

  Department of Electronics, Faculty of Engineering, Tohoku University

• OHMI T.

  Department of Electronics, Faculty of Engineering, Tohoku University

収録刊行物

• Extended abstracts of the ... Conference on Solid State Devices and Materials

  Extended abstracts of the ... Conference on Solid State Devices and Materials 1995 620-622, 1995-08-21

詳細情報

• CRID: 1573387450032464128
• NII論文ID: 10017202831
• NII書誌ID: AA10777858
• 本文言語コード: en
• データソース種別:
  • CiNii Articles