Fabrication of Optically Active Er3+-Doped Bi2O3–SiO2 Glass Thin Films by Pulsed Laser Deposition

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著者

    • Akiba Shusaku Akiba Shusaku
    • Materials and Structures Laboratory, Tokyo Institute of Technology, 4259-R3-6 Nagatsuta-cho, Midori-ku, Yokohama 226-8503, Japan
    • Hara Wakana
    • Materials and Structures Laboratory, Tokyo Institute of Technology, 4259-R3-6 Nagatsuta-cho, Midori-ku, Yokohama 226-8503, Japan
    • Okada Takashi
    • Materials and Structures Laboratory, Tokyo Institute of Technology, 4259-R3-6 Nagatsuta-cho, Midori-ku, Yokohama 226-8503, Japan
    • Watanabe Takahiro
    • Materials and Structures Laboratory, Tokyo Institute of Technology, 4259-R3-6 Nagatsuta-cho, Midori-ku, Yokohama 226-8503, Japan
    • Kondo Yuki
    • Research Center, Asahi Glass Co., Ltd., 1150 Hazawa-cho, Kanagawa-ku, Yokohama 221-8755, Japan
    • Ito Setsuro
    • Research Center, Asahi Glass Co., Ltd., 1150 Hazawa-cho, Kanagawa-ku, Yokohama 221-8755, Japan
    • Ahmet Parhat
    • Frontier Collaborative Research Center, Tokyo Institute of Technology, 4259-R3-6 Nagatsuta-cho, Midori-ku, Yokohama 226-8503, Japan
    • Chikyo Toyohiro
    • National Institute for Material Science, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan
    • Tanabe Setsuhisa
    • Graduate School of Human and Environmental Studies, Kyoto University, Sakyo-ku, Kyoto 606-8501, Japan
    • Hanada Teiichi
    • Department of Chemistry, Graduate School of Science, Kyoto University, Kyoto 606-8501, Japan
    • Yoshimoto Mamoru
    • Materials and Structures Laboratory, Tokyo Institute of Technology, 4259-R3-6 Nagatsuta-cho, Midori-ku, Yokohama 226-8503, Japan

抄録

We examined the fabrication conditions of optically active Er3+-doped Bi2O3–SiO2 glass thin films prepared by pulsed laser deposition using a glass target with a nominal composition (mol %) of 41Bi2O3$\cdot$57SiO2$\cdot$2Er2O3. The transparent glass films were obtained at 200 °C under $5 \times 10^{-2}$ Torr O2. The glass films were found to possess a composition and a refractive index close to those of the bulk glass used as the target. The films exhibited a broad emission of Er3+ ions at around 1.5–1.6 μm as well as Er3+ upconversion-pumped fluorescence in the 500–700 nm range.

収録刊行物

  • Japanese journal of applied physics. Pt. 1, Regular papers & short notes

    Japanese journal of applied physics. Pt. 1, Regular papers & short notes 45(7), 5933-5935, 2006-07-15

    Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

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各種コード

  • NII論文ID(NAID)
    10018000333
  • NII書誌ID(NCID)
    AA10457675
  • 本文言語コード
    EN
  • 資料種別
    SHO
  • 雑誌種別
    大学紀要
  • ISSN
    0021-4922
  • NDL 記事登録ID
    7979268
  • NDL 雑誌分類
    ZM35(科学技術--物理学)
  • NDL 請求記号
    Z53-A375
  • データ提供元
    CJP書誌  NDL  JSAP 
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