# Fabrication of Optically Active Er3+-Doped Bi2O3–SiO2 Glass Thin Films by Pulsed Laser Deposition

## 抄録

We examined the fabrication conditions of optically active Er3+-doped Bi2O3–SiO2 glass thin films prepared by pulsed laser deposition using a glass target with a nominal composition (mol %) of 41Bi2O3$\cdot$57SiO2$\cdot$2Er2O3. The transparent glass films were obtained at 200 °C under $5 \times 10^{-2}$ Torr O2. The glass films were found to possess a composition and a refractive index close to those of the bulk glass used as the target. The films exhibited a broad emission of Er3+ ions at around 1.5–1.6 μm as well as Er3+ upconversion-pumped fluorescence in the 500–700 nm range.

## 収録刊行物

• Japanese journal of applied physics. Pt. 1, Regular papers & short notes

Japanese journal of applied physics. Pt. 1, Regular papers & short notes 45(7), 5933-5935, 2006-07-15

Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

## 各種コード

• NII論文ID(NAID)
10018000333
• NII書誌ID(NCID)
AA10457675
• 本文言語コード
EN
• 資料種別
SHO
• 雑誌種別
大学紀要
• ISSN
0021-4922
• NDL 記事登録ID
7979268
• NDL 雑誌分類
ZM35(科学技術--物理学)
• NDL 請求記号
Z53-A375
• データ提供元
CJP書誌  NDL  JSAP

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