Removing focused ion-beam damages on transmission electron microscopy specimens by using a plasma cleaner

この論文をさがす

著者

    • HATA Satoshi
    • Department of Applied Science for Electronics and Materials, Kyushu University
    • SOSIATI Harini
    • The Research Laboratory for High Voltage Electron Microscopy, Kyushu University
    • KUWANO Noriyuki
    • Art, Science and Technology Center for Cooperative Research, Kyushu University
    • ITAKURA Masaru
    • Department of Applied Science for Electronics and Materials, Kyushu University
    • NAKANO Takayoshi
    • Division of Materials & Manufacturing Science, Graduate School of Engineering, Osaka University
    • UMAKOSHI Yukichi
    • Division of Materials & Manufacturing Science, Graduate School of Engineering, Osaka University

収録刊行物

  • Journal of electron microscopy  

    Journal of electron microscopy 55(1), 23-26, 2006-01-01 

参考文献:  15件

参考文献を見るにはログインが必要です。ユーザIDをお持ちでない方は新規登録してください。

各種コード

  • NII論文ID(NAID)
    10018006189
  • NII書誌ID(NCID)
    AA00697060
  • 本文言語コード
    ENG
  • 資料種別
    NOT
  • ISSN
    00220744
  • データ提供元
    CJP書誌 
ページトップへ