高周波多重磁極スパッタ法によるニッケル薄膜の作製 Sputter Deposition of Ni Thin Films Using an rf Sputtering with Multipolar Magnets

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著者

    • 岡山 勇太 OKAYAMA Yuta
    • 広島工業大学工学部電子・光システム工学科 Department of Electronics and Photonic Systems Engineering, Hiroshima Institute of Technology
    • 竹迫 寿晃 TAKESAKO Kazuaki
    • 広島工業大学工学部電子・光システム工学科 Department of Electronics and Photonic Systems Engineering, Hiroshima Institute of Technology
    • 古瀬 寛和 [他] KOSE Hirokazu
    • 広島工業大学工学部電子・光システム工学科 Department of Electronics and Photonic Systems Engineering, Hiroshima Institute of Technology
    • 川畑 敬志 KAWABATA Keishi
    • 広島工業大学工学部電子・光システム工学科 Department of Electronics and Photonic Systems Engineering, Hiroshima Institute of Technology

抄録

  We have developed an rf sputtering with multipolar magnets around the target in the rf sputtering system of a magnetic Ni (200 mmφ, 5 mm thick) target to deposit Ni thin films. When permanent magnets, made of Nd-Fe-B material with a surface magnetic flux density of 0.57 T, were placed around the Ni target outside the vacuum chamber, a magnetic flux density measured at the position of 5 mm above the target surface was distributed in the range of 0~0.37 T.<br>   It is shown that the deposition rate significantly increases from 3.7 to 5.4 nm/min with values increased up to two times that of a conventional rf sputtering. It is also revealed that the discharge produced by an rf sputtering with external magnets can be sustained at a lower Ar gas pressure of down to 8.0×10<sup>-1</sup> Pa.<br>

収録刊行物

  • 真空 = JOURNAL OF THE VACUUM SOCIETY OF JAPAN  

    真空 = JOURNAL OF THE VACUUM SOCIETY OF JAPAN 49(3), 159-161, 2006-03-20 

    The Vacuum Society of Japan

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各種コード

  • NII論文ID(NAID)
    10018133557
  • NII書誌ID(NCID)
    AN00119871
  • 本文言語コード
    JPN
  • 資料種別
    SHO
  • ISSN
    05598516
  • NDL 記事登録ID
    7931033
  • NDL 雑誌分類
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL 請求記号
    Z16-474
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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