高周波マグネトロンスパッタリング法によるPb(Zr, Ti)O_3圧電薄膜の量産技術 The Mass Production Technology of Pb(Zr, Ti)O_3 Piezoelectric Thin Film by Radio Frequency Magnetron Sputtering

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  In this study, SME-200 (ULVAC and Inc.) was the mass production system of a PZT deposition got over the problems, and it was there, and deposition temperature of PZT thin films were investigated as a parameter by this research. (100)/(001) and (111) oriented Pb(Zr, Ti)O<sub>3</sub> Piezoelectric thin films were fabricated on (111)Pt/Ti/SiO<sub>2</sub>/Si substrate using a RF magnetron sputtering technique. Polarization and displacement in these films were simultaneously observed through an atomic force microscope (AFM) that was attached to a ferroelectric test system. As a result, 3-μm-thick PZT film with P<sub>r</sub> value of 41 μm/cm<sup>2</sup> at an applied voltage of 30 V were obtained for (100)/(001) oriented film.<br>

収録刊行物

  • 真空 = JOURNAL OF THE VACUUM SOCIETY OF JAPAN  

    真空 = JOURNAL OF THE VACUUM SOCIETY OF JAPAN 49(3), 174-176, 2006-03-20 

    The Vacuum Society of Japan

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各種コード

  • NII論文ID(NAID)
    10018133593
  • NII書誌ID(NCID)
    AN00119871
  • 本文言語コード
    JPN
  • 資料種別
    SHO
  • ISSN
    05598516
  • NDL 記事登録ID
    7931165
  • NDL 雑誌分類
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL 請求記号
    Z16-474
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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