パーフルオロ化合物プラズマ下流における気相分子成長 : 観測・反応・成膜 Growth of Gaseous Macromolecules in the Downstream Region of Perfluorocompounds Plasmas : Observation, Reaction Mechanism, Thin Film Formation

この論文にアクセスする

この論文をさがす

著者

    • 古屋 謙治 FURUYA Kenji
    • 九州大学大学院総合理工学研究院物質科学部門 Department of Molecular and Material Sciences, Kyushu University
    • 雪田 忍 YUKITA Shinobu
    • 九州大学大学院総合理工学研究院物質科学部門 Department of Molecular and Material Sciences, Kyushu University
    • 蒔田 慎 MAKITA Makoto
    • 九州大学大学院総合理工学研究院物質科学部門 Department of Molecular and Material Sciences, Kyushu University
    • 原田 明 HARATA Akira
    • 九州大学大学院総合理工学研究院物質科学部門 Department of Molecular and Material Sciences, Kyushu University

抄録

  The growth of gaseous neutral species and positive ions has been investigated in the downstream region of perfluorocompounds plasmas by mass spectrometry. As a result, there were several series of C<sub>n</sub>F<sub>2n+1</sub><sup>+</sup>, C<sub>n</sub>F<sub>2n-1</sub><sup>+</sup> and C<sub>n</sub>F<sub>2n-3</sub><sup>+</sup> for the positive ions and C<sub>n</sub>F<sub>2n+2</sub> and C<sub>n</sub>F<sub>2n</sub> for the neutral species up to 400 amu in the Ar/CF<sub>4</sub> plasmas. The logarithmic plots of the C<sub>n</sub>F<sub>2n+1</sub><sup>+</sup> intensity at n≥2 and the C<sub>n</sub>F<sub>2n-1</sub><sup>+</sup> intensity at n≥3 with respect to the mass number in the CF<sub>4</sub> case were decreased linearly with increase of the mass number. Such property in the plots can be explained by considering the rate equations for the addition reactions of CF<sub>2</sub> to C<sub>n</sub>F<sub>2n+1</sub><sup>+</sup> at n≥2 and C<sub>n</sub>F<sub>2n-1</sub><sup>+</sup> at n≥3 under the steady-state approximation. Nano-particle formation using the macromolecules growing in the downstream region of the Ar/c-C<sub>4</sub>F<sub>8</sub> plasma was confirmed through X-ray photoelectron spectroscopy and atomic force microscopy.<br>

収録刊行物

  • 真空 = JOURNAL OF THE VACUUM SOCIETY OF JAPAN  

    真空 = JOURNAL OF THE VACUUM SOCIETY OF JAPAN 49(3), 195-197, 2006-03-20 

    The Vacuum Society of Japan

参考文献:  7件

参考文献を見るにはログインが必要です。ユーザIDをお持ちでない方は新規登録してください。

各種コード

  • NII論文ID(NAID)
    10018133650
  • NII書誌ID(NCID)
    AN00119871
  • 本文言語コード
    JPN
  • 資料種別
    SHO
  • ISSN
    05598516
  • NDL 記事登録ID
    7931241
  • NDL 雑誌分類
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL 請求記号
    Z16-474
  • データ提供元
    CJP書誌  NDL  J-STAGE 
ページトップへ