Effects of Ion Assistance and Substrate Temperature on Optical Characteristics and Microstructure of MgF2 Films Formed by Electron-Beam Evaporation

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著者

    • Lu Chih-Jung
    • Department of Materials Engineering, National Chung Hsing University, Tai-Chung 402, Taiwan
    • Liu Ming-Chung
    • Thin Film Technology Center and Institute of Optical Science, National Central University, Chung-Li 320, Taiwan
    • Lee Chin-Han
    • Thin Film Technology Center and Institute of Optical Science, National Central University, Chung-Li 320, Taiwan
    • Chen Hsi-Chao
    • Thin Film Technology Center and Institute of Optical Science, National Central University, Chung-Li 320, Taiwan

抄録

Magnesium fluoride thin films were prepared by electron-beam evaporation and ion-assisted deposition (IAD). The effects of ion assistance and substrate temperature during deposition on the optical properties and microstructure were studied. The grain size, the crystallinity and the surface roughness of MgF2 films deposited without ion assistance all decreased with substrate temperature. MgF2 films deposited with IAD exhibited small grains, rough surfaces, fluorine deficiencies and large optical losses in the 200–500 nm wavelength range when bombarded with argon ions.

収録刊行物

  • Japanese journal of applied physics. Pt. 1, Regular papers & short notes  

    Japanese journal of applied physics. Pt. 1, Regular papers & short notes 45(6A), 5027-5029, 2006-06-15 

    Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

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各種コード

  • NII論文ID(NAID)
    10018148550
  • NII書誌ID(NCID)
    AA10457675
  • 本文言語コード
    EN
  • 資料種別
    ART
  • 雑誌種別
    大学紀要
  • ISSN
    0021-4922
  • NDL 記事登録ID
    7940964
  • NDL 雑誌分類
    ZM35(科学技術--物理学)
  • NDL 請求記号
    Z53-A375
  • データ提供元
    CJP書誌  NDL  JSAP 
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