Ti/Pt/(Pt–TaOX) Electrode Fabricated by Thermal Decomposition and Si/Pt/TaOX Electrode Fabricated by Sputtering for Ozone Generation

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著者

    • Takaoka Daizo
    • Human Ecology Research Center, Sanyo Electric Co., Ltd., 1-1-1 Sakata, Oizumi, Ora, Gunma 370-0596, Japan
    • Higuchi Tohru
    • Faculty of Science, Tokyo University of Science, 1-3 Kagurazaka, Shinjuku-ku, Tokyo 162-8601, Japan
    • Hattori Takeshi
    • Faculty of Science, Tokyo University of Science, 1-3 Kagurazaka, Shinjuku-ku, Tokyo 162-8601, Japan
    • Tsukamoto Takeyo
    • Faculty of Science, Tokyo University of Science, 1-3 Kagurazaka, Shinjuku-ku, Tokyo 162-8601, Japan
    • Yasuda Masashi
    • Human Ecology Research Center, Sanyo Electric Co., Ltd., 1-1-1 Sakata, Oizumi, Ora, Gunma 370-0596, Japan

抄録

Two types of electrodes for electrochemical generation of ozone were fabricated by thermal decomposition and sputtering. Ozone generation was observed using both the electrodes. The catalyst layer of the electrode, fabricated by thermal decomposition, functions as an insulator comprising of tantalum oxide and platinum. It had many cracks, and some of them extended up to the platinum-buffered layer. However, we have not explained the ozone generation by the current concentration in the platinum-buffered layers due to the passage of an electrolyte through the cracks alone. On the other hand, the catalyst layer of the electrode fabricated by sputtering was also an insulator comprising only of tantalum oxide; this layer was also crack free. Because of the thin catalyst layer (ca. 20 nm), electrons drifted through it thereby causing electrolysis (i.e., ozone was generated). The results show that tantalum oxide functions as a catalyst of ozone generation. Therefore, with regard to electrolysis using the electrode fabricated by thermal decomposition, ozone generation by an electrochemical reaction is possible in both the thin layer of tantalum oxide, in which cracks on the inner wall extend up to the interior of the catalyst layer, and the platinum-buffered layer.

収録刊行物

  • Japanese journal of applied physics. Pt. 1, Regular papers & short notes

    Japanese journal of applied physics. Pt. 1, Regular papers & short notes 45(6A), 5154-5162, 2006-06-15

    Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

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各種コード

  • NII論文ID(NAID)
    10018148979
  • NII書誌ID(NCID)
    AA10457675
  • 本文言語コード
    EN
  • 資料種別
    ART
  • 雑誌種別
    大学紀要
  • ISSN
    0021-4922
  • NDL 記事登録ID
    7941302
  • NDL 雑誌分類
    ZM35(科学技術--物理学)
  • NDL 請求記号
    Z53-A375
  • データ提供元
    CJP書誌  NDL  JSAP 
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