Atmospheric Pressure Fluorocarbon-Particle Plasma Chemical Vapor Deposition for Hydrophobic Film Coating

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著者

    • Nagai Mikio Nagai Mikio
    • Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
    • Hori Masaru Hori Masaru
    • Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan

抄録

We have realized a fluorocarbon-particle plasma chemical vapor deposition employing an atmospheric pressure plasma with continuous-wave microwave excitation. Spherical fluorocarbon particles 50–100 nm in diameter were formed in the atmospheric pressure plasma. The gas temperature in the plasma was controlled to be 480 K, as estimated using numerical calculations from N2 emission spectra. It was found that the gas temperature was an important factor for the synthesis of the fluorocarbon particles. The particles were negatively charged downstream from the plasma and were transported efficiently to the substrate by an electric field. A hydrophobic coating with a contact angle of 140° was achieved at room temperature.

収録刊行物

  • Japanese journal of applied physics. Pt. 2, Letters  

    Japanese journal of applied physics. Pt. 2, Letters 45(17), L460-L462, 2006-05-25 

    Japan Society of Applied Physics

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各種コード

  • NII論文ID(NAID)
    10018157410
  • NII書誌ID(NCID)
    AA10650595
  • 本文言語コード
    EN
  • 資料種別
    SHO
  • ISSN
    0021-4922
  • NDL 記事登録ID
    7926158
  • NDL 雑誌分類
    ZM35(科学技術--物理学)
  • NDL 請求記号
    Z54-J337
  • データ提供元
    CJP書誌  NDL  JSAP 
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