Atmospheric Pressure Fluorocarbon-Particle Plasma Chemical Vapor Deposition for Hydrophobic Film Coating
We have realized a fluorocarbon-particle plasma chemical vapor deposition employing an atmospheric pressure plasma with continuous-wave microwave excitation. Spherical fluorocarbon particles 50–100 nm in diameter were formed in the atmospheric pressure plasma. The gas temperature in the plasma was controlled to be 480 K, as estimated using numerical calculations from N2 emission spectra. It was found that the gas temperature was an important factor for the synthesis of the fluorocarbon particles. The particles were negatively charged downstream from the plasma and were transported efficiently to the substrate by an electric field. A hydrophobic coating with a contact angle of 140° was achieved at room temperature.
- Japanese journal of applied physics. Pt. 2, Letters
Japanese journal of applied physics. Pt. 2, Letters 45(17), L460-L462, 2006-05-25
Japan Society of Applied Physics