Ultrashallow Arsenic n〔+〕/p Junction Formed by AsH3 Plasma Doping

• Sungho Heo

• Sungkweon Baek

• Dongkyu Lee

書誌事項

タイトル別名

• Ultrashallow Arsenic n p Junction Formed by AsH3 Plasma Doping

収録刊行物

• Japanese journal of applied physics. Part 2, Letters & express letters

  Japanese journal of applied physics. Part 2, Letters & express letters 45 (12-16), L373-375, 2006-04

  Tokyo : Japan Society of Applied Physics

キーワード

• PLAD
• hydrogen effect
• pre-annealing

詳細情報

• CRID: 1520573329776257152
• NII論文ID: 10018157758
• NII書誌ID: AA11906093
• ISSN: 00214922
• NDL書誌ID: 7893705
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I7893705
• 本文言語コード: en
• NDL 雑誌分類:
  • ZM35(科学技術--物理学)
• データソース種別:
  • NDL
  • CiNii Articles