TiO2-Coated Transparent Conductive Oxide (SnO2:F) Films Prepared by Atmospheric Pressure Chemical Vapor Deposition with High Durability against Atomic Hydrogen
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The durability of textured transparent conductive oxide (TCO) thin films against atomic hydrogen was investigated. An ultrathin TiO2 layer of 2 nm thickness was deposited on textured fluorine-doped tin oxide (SnO2:F) films, successively by atmospheric pressure chemical vapor deposition (AP-CVD). TCO films with a TiO2 layer showed a higher optical transmittance and a lower resistivity after exposure to atomic hydrogen excited by very high frequency (VHF) plasma, while TCO films without a TiO2 layer showed a lower optical transmittance and a higher resistivity after the exposure. These TCO films were characterized by X-ray photoelectron spectroscopy (XPS) and secondary ion mass spectroscopy (SIMS) before and after the exposure to atomic hydrogen.
- Jpn J Appl Phys
Jpn J Appl Phys 45(10), L291-L293, 2006-03-25
INSTITUTE OF PURE AND APPLIED PHYSICS