Preparation of Amorphous Fluorinated Carbon Film Using Low Global-Warming Potential Gas, C_4F_6, by Plasma Enhanced Chemical Vapor Deposition

• WATANABE Hiroki

  Department of Materials Engineering, The University of Tokyo

• TOKIMITSU Takumi

  Department of Materials Engineering, The University of Tokyo

• SHIGA Jyunko

  Division of Electrical Engineering, Yokohama National University

• HANEJI Nobuo

  Division of Electrical Engineering, Yokohama National University

• SHIMOGAKI Yukihiro

  Department of Materials Engineering, The University of Tokyo

Journal

• Japanese journal of applied physics. Pt. 2, Letters

  Japanese journal of applied physics. Pt. 2, Letters 45 (4), L151-L153, 2006-02-25

Keywords

• PECVD
• C_4F_6
• GWP
• dielectric constant
• C-CF bond

Details

• CRID: 1573950400148789248
• NII Article ID: 10018158977
• NII Book ID: AA10650595
• ISSN: 00214922
• Text Lang: en
• Data Source:
  • CiNii Articles