Reactivity of Acid Generators for Chemically Amplified Resists with Low-Energy Electrons

• Atsuro Nakano

• Takahiro Kozawa

• Seiichi Tagawa

Bibliographic Information

Other Title

• Reactivity of Acid Generators for Chemically Amplified Resists with Low Energy Electrons

Journal

• Japanese journal of applied physics. Part 2, Letters & express letters

  Japanese journal of applied physics. Part 2, Letters & express letters 45 (4-7), L197-200, 2006

  Tokyo : Japan Society of Applied Physics

Keywords

• acid generator
• chemically amplified resist
• electron beam lithography
• EUV lithography

Details

• CRID: 1523388079620968832
• NII Article ID: 10018159212
• NII Book ID: AA11906093
• ISSN: 00214922
• NDL BIB ID: 7822740
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I7822740
• Text Lang: en
• NDL Source Classification:
  • ZM35(科学技術--物理学)
• Data Source:
  • NDL
  • CiNii Articles