InP Etching by HI/Xe Inductively Coupled Plasma for Photonic-Crystal Device Fabrication

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著者

    • IDE Toshihide
    • Department of Electrical and Computer Engineering, Yokohama National University
    • HASHIMOTO Jun-ichi
    • Department of Electrical and Computer Engineering, Yokohama National University
    • NOZAKI Kengo
    • Department of Electrical and Computer Engineering, Yokohama National University
    • MIZUTA Eiichi
    • Department of Electrical and Computer Engineering, Yokohama National University
    • BABA Toshihiko
    • Department of Electrical and Computer Engineering, Yokohama National University

収録刊行物

  • Japanese journal of applied physics. Pt. 2, Letters

    Japanese journal of applied physics. Pt. 2, Letters 45(1), L102-L104, 2006-01-25

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  • Characterization of chemically assisted ion beam etching of InP

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各種コード

  • NII論文ID(NAID)
    10018159813
  • NII書誌ID(NCID)
    AA10650595
  • 本文言語コード
    ENG
  • 資料種別
    SHO
  • ISSN
    00214922
  • データ提供元
    CJP書誌 
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