InP Etching by HI/Xe Inductively Coupled Plasma for Photonic-Crystal Device Fabrication

• IDE Toshihide

  Department of Electrical and Computer Engineering, Yokohama National University

• HASHIMOTO Jun-ichi

  Department of Electrical and Computer Engineering, Yokohama National University

• NOZAKI Kengo

  Department of Electrical and Computer Engineering, Yokohama National University

• MIZUTA Eiichi

  Department of Electrical and Computer Engineering, Yokohama National University

• BABA Toshihiko

  Department of Electrical and Computer Engineering, Yokohama National University

収録刊行物

• Japanese journal of applied physics. Pt. 2, Letters

  Japanese journal of applied physics. Pt. 2, Letters 45 (1), L102-L104, 2006-01-25

キーワード

• dry etching
• ICP
• InP
• HI
• photonic crystal
• nanolaser

詳細情報

• CRID: 1570854175405203456
• NII論文ID: 10018159813
• NII書誌ID: AA10650595
• ISSN: 00214922
• 本文言語コード: en
• データソース種別:
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