回転リングディスク電極を用いた界面pH測定とそのNi-Al(OH)_3複合めっきへの適用 In Situ Interfacial pH Measurement Using Rotating Ring Disk Electrode and Its Application for Ni-Al(OH)_3 Composite Plating

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The interfacial pH during Ni plating from the Watts bath was measured by using a rotating ring disk electrode system where the Sb-plated ring electrode acts as a pH sensor. It was clarified that a linear relationship exists between the electrode potential of the Sb-plated ring electrode and the pH in the range from 2.0 to 6.5 and was also clarified that the Sb-plated rotating ring electrode could be used as a pH sensor for the electroplating process in these pH ranges. The Ni-Al(OH)<sub>3</sub> composite film was electrodeposited by controlling current density under certain conditions, while the rise of interfacial pH during the plating process was estimated from the in situ pH measurement described above. The results of the SEM/EDX observations showed that minute particles, probably aluminum hydroxide, could be deposited with nickel from Al<sup>3+</sup> contained in a non-turbid Watts bath under certain conditions determined by the interfacial pH measurement described herein.<br>

収録刊行物

  • 表面技術 = The Journal of the Surface Finishing Society of Japan  

    表面技術 = The Journal of the Surface Finishing Society of Japan 57(8), 597-600, 2006-08-01 

    The Surface Finishing Society of Japan

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各種コード

  • NII論文ID(NAID)
    10018208765
  • NII書誌ID(NCID)
    AN1005202X
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    09151869
  • NDL 記事登録ID
    8066486
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z17-291
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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