Low Temperature and High Rate Deposition of Ferrite Thin Films by Reactive Sputtering Method Using Electron Cyclotron Eesonance
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- TANAKA Terumitsu
- Faculty of Engineering, Yamaguchi University
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- OSHIRO Kazunori
- Applied Medical Engineering Science, Graduate School of Medicine, Yamaguchi University
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- FUJIMORI Hirotaka
- Applied Medical Engineering Science, Graduate School of Medicine, Yamaguchi University
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- KURISU Hiroki
- Faculty of Engineering, Yamaguchi University
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- SHIMOSATO Yoshihiro
- SHIMADZU CORPORATION
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- OKADA Shigenobu
- SHIMADZU CORPORATION
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- MATSUURA Mitsuru
- Faculty of Engineering, Yamaguchi University
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- YAMAMOTO Setsuo
- Applied Medical Engineering Science, Graduate School of Medicine, Yamaguchi University
Bibliographic Information
- Other Title
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- 反応性電子サイクロトロン共鳴(ECR)スパッタ法によるフェライト薄膜の低温高速作製
- ハンノウセイ デンシ サイクロトロン キョウメイ ECR スパッタホウ ニ ヨル フェライト ハクマク ノ テイオン コウソク サクセイ
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Abstract
A reactive sputtering apparatus utilizing electron cyclotron resonance (ECR) was developed for the deposition of thick oxide or nitride films usable in electric devices. A high deposition rate of 44 nm/min. was achieved using a conic alloy target and the deposited soft ferrite thin films were successfully crystallized without heat treatment during film deposition. Magnetic and physical properties for the film were analyzed in terms of saturation magnetization, coercivity, uniformity of film thickness, and inner stress. Obtained properties were consistent with soft magnetic films. The result confirms the oxygen partial pressure ratio to deposition rate strongly affected the magnetic properties. Well crystallized, ultra thin 3-nm-thick Ni-Zn ferrite (100) films, were also successfully deposited on MgO (100) underlayers. These results imply the ECR sputtering method is one of the most effective deposition methods for highly crystallized polycrystalline thick and thin films. Crystal orientation was improved by low target voltage sputtering as well as a relatively low deposition rate. Further improvement is considered to be possible by deposition at lower base pressures.<br>
Journal
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- Shinku
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Shinku 49 (7), 424-429, 2006
The Vacuum Society of Japan
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Details
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- CRID
- 1390282679041622912
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- NII Article ID
- 10018210320
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- NII Book ID
- AN00119871
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- ISSN
- 18809413
- 05598516
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- NDL BIB ID
- 8058324
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed