スパッタ法によるNi-Cr複合酸化物薄膜の作製と特性 Properties of the Ni-Cr Oxide Films Prepared by Magnetron Sputtering

この論文にアクセスする

この論文をさがす

著者

抄録

  Thin films of Ni-Cr oxide were prepared by magnetron sputtering of NiO-Cr<sub>2</sub>O<sub>3</sub> (1 : 1 mol ratio) target in a gas mixture of oxygen and argon. The dependence of the partial pressure ratio <i>R</i> of oxygen to the toal sputtering gas on the compositional, optical and electrical properties of the films was investigated from a standpoint of an application to the infrared sensor. With increasing <i>R</i>, the Ni(220) peak of XRD increases, the optical bandgap decreases and the dc conductivity σ as well as the thermistor coefficient <i>B</i><sub>th</sub> increases. It is found that a set of relatively high values of σ and <i>B</i><sub>th</sub> for the infrared sensor is obtained in the range of <i>R</i> around 10%.<br>

収録刊行物

  • 真空 = JOURNAL OF THE VACUUM SOCIETY OF JAPAN  

    真空 = JOURNAL OF THE VACUUM SOCIETY OF JAPAN 49(7), 443-445, 2006-07-20 

    The Vacuum Society of Japan

参考文献:  11件

参考文献を見るにはログインが必要です。ユーザIDをお持ちでない方は新規登録してください。

各種コード

  • NII論文ID(NAID)
    10018210384
  • NII書誌ID(NCID)
    AN00119871
  • 本文言語コード
    JPN
  • 資料種別
    SHO
  • ISSN
    05598516
  • NDL 記事登録ID
    8058379
  • NDL 雑誌分類
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL 請求記号
    Z16-474
  • データ提供元
    CJP書誌  NDL  J-STAGE 
ページトップへ