Novel Structure and Fabrication Process for Integrated RF Microelectromechanical-System Technology
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This paper describes a novel structure and fabrication process for the integration of several types of RF microelectromechanical-system (MEMS) device, such as switches and varactors having different structures. It also describes an encapsulation technique suitable for the integrated devices to protect movable parts during packaging. An adaptable multilayer structure and its fabrication process, which includes planarization with photosensitive polyimide, are proposed for integration. A capsule structure fabricated using spin-coating film transfer and hot-pressing technology is also proposed for protection. Several types of RF MEMS device were simultaneously fabricated on the same substrate using these techniques. The results confirm that these techniques will pave the way for the development of single-chip RF transceivers with integrated RF MEMS devices.
- Jpn J Appl Phys
Jpn J Appl Phys 45(9A), 6849-6853, 2006-09-15
INSTITUTE OF PURE AND APPLIED PHYSICS