Acid Generation Mechanism of Poly(4-hydroxystyrene)-Based Chemically Amplified Resists for Post-Optical Lithography: Acid Yield and Deprotonation Behavior of Poly(4-hydroxystyrene) and Poly(4-methoxystyrene)

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著者

    • Nakano Atsuro Nakano Atsuro
    • The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
    • Tagawa Seiichi
    • The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
    • Kai Toshiyuki
    • JSR Corporation, 100, Kawajiri-cho, Yokkaichi, Mie 510-8552, Japan

抄録

With the shrinkage of patterns, the elucidation of reaction mechanisms at the molecular level has become essential in resist design. In particular, proton dynamics is one of the most important issues on the sensitivity and resolution of chemically amplified resists. In chemically amplified resists for post-optical lithographies, such as extreme ultraviolet and electron beam lithographies, it has been reported that protons mainly come from not acid generators but polymers. Determining proton sources is a key to understanding reaction mechanisms at the molecular level. In this article, we investigated the deprotonation mechanism of poly(4-hydroxystyrene) and poly(4-methoxystyrene) upon exposure to ionizing radiation. We found that the difference between the proton labilities of polymer radical cations (proton source for acid generation) leads to a difference in acid yield.

収録刊行物

  • Japanese journal of applied physics. Pt. 1, Regular papers & short notes  

    Japanese journal of applied physics. Pt. 1, Regular papers & short notes 45(9A), 6866-6871, 2006-09-15 

    Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

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各種コード

  • NII論文ID(NAID)
    10018245439
  • NII書誌ID(NCID)
    AA10457675
  • 本文言語コード
    EN
  • 資料種別
    ART
  • 雑誌種別
    大学紀要
  • ISSN
    0021-4922
  • NDL 記事登録ID
    8055401
  • NDL 雑誌分類
    ZM35(科学技術--物理学)
  • NDL 請求記号
    Z53-A375
  • データ提供元
    CJP書誌  NDL  JSAP 
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