Improving Electrical Characteristics of High-$k$ NiTiO Dielectric with Nitrogen Ion Implantation

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抄録

A new high-dielectric-constant ($k$) NiTiO dielectric film with a low temperature has been investigated for the first time. The $k$ of the NiTiO film was estimated to be larger than 40. The roughness of the NiTiO dielectric film to nitrogen ion implantation (I/I) was uniform, thus causing a low leakage current (${<}10^{-9}$ A) and a high breakdown voltage (${>}25$ MV/cm2). These results are superior to those reported in the literature, suggesting a potential use of the NiTiO film as dielectric for future RF/mixed IC applications.

収録刊行物

  • Japanese journal of applied physics. Pt. 1, Regular papers & short notes

    Japanese journal of applied physics. Pt. 1, Regular papers & short notes 45(9A), 6902-6904, 2006-09-15

    Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

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キーワード

各種コード

  • NII論文ID(NAID)
    10018245635
  • NII書誌ID(NCID)
    AA10457675
  • 本文言語コード
    EN
  • 資料種別
    SHO
  • 雑誌種別
    大学紀要
  • ISSN
    0021-4922
  • NDL 記事登録ID
    8055604
  • NDL 雑誌分類
    ZM35(科学技術--物理学)
  • NDL 請求記号
    Z53-A375
  • データ提供元
    CJP書誌  NDL  JSAP 
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