プラズマCVDプロセスにおける微粒子の挙動と微粒子汚染制御手法 Particle Behavior and Control Method of Particulate Contamination in Plasma CVD Process
The application of plasma processing technologies to the engineering and industrial fields is expanding. Fine particles suspended in plasma, often called plasma dust, are known to be a major factor of disturbing the manufacturing processes of electronic devices, etc. Therefore, studies on the formation and behavior of fine particles in plasma are important from the viewpoint of developing methods to control plasma dust. In this article, recent studies are introduced on the observation and discussion for dust in a plasma CVD reactor using a particle visualization technique based on laser light scattering, and on the methods for suppressing particulate contamination by plasma dust.
- エアロゾル研究 = Journal of aerosol research
エアロゾル研究 = Journal of aerosol research 21(3), 209-214, 2006-09-20