プラズマCVDプロセスにおける微粒子の挙動と微粒子汚染制御手法  [in Japanese] Particle Behavior and Control Method of Particulate Contamination in Plasma CVD Process  [in Japanese]

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Author(s)

    • 林 豊 HAYASHI Yutaka
    • 広島大学大学院工学研究科 Department of Chemical Engineering, Graduate School of Engineering, Hiroshima University
    • 島田 学 SHIMADA Manabu
    • 広島大学大学院工学研究科 Department of Chemical Engineering, Graduate School of Engineering, Hiroshima University

Abstract

The application of plasma processing technologies to the engineering and industrial fields is expanding. Fine particles suspended in plasma, often called plasma dust, are known to be a major factor of disturbing the manufacturing processes of electronic devices, etc. Therefore, studies on the formation and behavior of fine particles in plasma are important from the viewpoint of developing methods to control plasma dust. In this article, recent studies are introduced on the observation and discussion for dust in a plasma CVD reactor using a particle visualization technique based on laser light scattering, and on the methods for suppressing particulate contamination by plasma dust.

Journal

  • Earozoru Kenkyu  

    Earozoru Kenkyu 21(3), 209-214, 2006-09-20 

    Japan Association of Aerosol Science and Technology

References:  28

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Codes

  • NII Article ID (NAID)
    10018250228
  • NII NACSIS-CAT ID (NCID)
    AN10041511
  • Text Lang
    JPN
  • Article Type
    REV
  • ISSN
    09122834
  • NDL Article ID
    8516511
  • NDL Source Classification
    ZP5(科学技術--化学・化学工業--化学工学)
  • NDL Call No.
    Z17-1062
  • Data Source
    CJP  NDL  J-STAGE 
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