Preparation of Calcium Phosphate Films by Radiofrequency Magnetron Sputtering
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- Narushima Takayuki
- Tohoku University Biomedical Engineering Research Organization (TUBERO)
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- Ueda Kyosuke
- Department of Materials Processing, Tohoku University
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- Goto Takashi
- Institute for Materials Research, Tohoku University
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- Masumoto Hiroshi
- Institute for Materials Research, Tohoku University
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- Katsube Tomoyuki
- Tohoku University Biomedical Engineering Research Organization (TUBERO)
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- Kawamura Hiroshi
- Graduate School of Dentistry, Tohoku University
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- Ouchi Chiaki
- Department of Materials Processing, Tohoku University
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- Iguchi Yasutaka
- Department of Materials Processing, Tohoku University
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Abstract
Calcium phosphate films were prepared on titanium substrates by radiofrequency (RF) magnetron sputtering at RF powers from 75 to 150 W. Hot-pressed β-tricalcium phosphate (β-TCP) plates with a high density (>99.6%) were used as a sputtering target. The substrate was not intentionally heated. The films consisted of amorphous calcium phosphate and oxyapatite (Ca10(PO4)6O) phases. The ratio of the oxyapatite phase depended on the sputtering conditions of RF power, oxygen gas concentration in the sputtering gas (CO<SUB>2</SUB>) and total pressure in the chamber. The (002) preferred orientation of oxyapatite phase was observed. The deposition rate of films increased with increasing RF power and decreasing CO<SUB>2</SUB>. The highest deposition rate was 0.143 nm·s−1 (0.515 μm·h−1).
Journal
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- MATERIALS TRANSACTIONS
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MATERIALS TRANSACTIONS 46 (10), 2246-2252, 2005
The Japan Institute of Metals and Materials
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Details 詳細情報について
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- CRID
- 1390282679227555968
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- NII Article ID
- 10018277765
- 130004452619
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- NII Book ID
- AA1151294X
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- ISSN
- 13475320
- 13459678
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- HANDLE
- 10097/51987
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- NDL BIB ID
- 7487947
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- Text Lang
- en
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- Data Source
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- JaLC
- IRDB
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed