球上の過冷膜沸騰における蒸気膜の安定性 Stability of Vapor Film in Subcooled Film Boiling on a Sphere

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The previously proposed linear stability theory of vapor film in subcooled film boiling on a sphere was generalized to take account of the interaction between the base flow and the perturbed component. A disturbance of standing wave type was assumed to be superimposed on the base flows of the surrounding liquid and the vapor film. For the surrounding liquid, the wave equation was applied to the whole region including the boundary layer and the energy equation was solved analytically by introducing a simplifying assumption. For the vapor film, the basic equations were solved by the integral method. By use of the compatibility conditions at the liquid-vapor interface, the solutions for the surrounding liquid and the vapor film were combined to yield an algebraic relation among the vapor film thickness, the order of disturbance and the complex amplification factor of the disturbance. The numerical solutions of the critical vapor film thickness at which the real part of the complex amplification factor was equal to zero were obtained for the disturbances of the orders of 0, 1 and 2. The numerical results indicated that the vapor film was most unstable for the disturbance of the 0-th order (i.e., uniform disturbance). The calculated value of the critical vapor film thickness for the uniform disturbance compared well with the average vapor film thickness at the minimum-heat-flux point obtained from the immersion cooling experiments of spheres in water at high liquid subcoolings.

収録刊行物

  • Thermal science and engineering  

    Thermal science and engineering 14(4), 83-93, 2006-10-01 

    The Heat Transfer Society of Japan

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各種コード

  • NII論文ID(NAID)
    10018290909
  • NII書誌ID(NCID)
    AA11358679
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    09189963
  • NDL 記事登録ID
    8566677
  • NDL 雑誌分類
    ZM5(科学技術--科学技術一般--工学・工業)
  • NDL 請求記号
    Z54-J404
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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